强激光与粒子束2016，Vol.28Issue(4)：22-27,6.DOI:10.11884/HPLPB201628.041004
光学元件亚表层裂纹成核临界条件研究
Critical condition of subsurface crack formation for optics
摘要
Abstract
Based on indentation experiments and continuous stiffness method,the relationship curves between indentation depth and hardness/elastic modulus were obtained for fused silica optics.The process of ductile to brittle transition was systemat-ically analyzed,and the critical loads and critical depths were determined in static/quasi-static indentation or dynamic scratch process.The results of gradient load scratch experiments show that the crack induced by scratch process has a strong dependence on the normal load,and the material removal is ductile removal with a small load.With the increase of normal load,the median cracks perpendicular to the specimen surface and lateral cracks parallel to specimen surface are produced,while no obvious fea-tures are observed on specimen surface.Lateral cracks are extended and the bright regions are formed,eventually the radial cracks are induced,whose propagation directions are perpendicular or approximately perpendicular to indenter movement direction,so brittle material removal is achieved.关键词
熔石英元件/亚表层裂纹/压痕形貌/延性去除/划痕实验Key words
fused silicon optics/subsurface defects/indentation morphology/ductile removal/scratch experiment分类
矿业与冶金引用本文复制引用
王洪祥,王景贺,严志龙,周岩,徐曦,钟波..光学元件亚表层裂纹成核临界条件研究[J].强激光与粒子束,2016,28(4):22-27,6.基金项目
国家自然科学基金项目(51475106) （51475106）
国家自然科学基金委员会-中国工程物理研究院联合基金项目(U1230110) （U1230110）
中国工程物理研究院超精密加工技术重点实验室开放基金项目(KF14007) （KF14007）
