电子器件Issue(1)：12-15,4.DOI:10.3969/j.issn.1005-9490.2016.01.003
微米金刚石薄膜的制备与场发射研究
Synthesis and Field Emission Properties of Diamond Microcrystalline
摘要
Abstract
The diamond microcrystalline films was fabricated by microwave plasma chemical vapor deposition(MP⁃CVD)method. The ceramic with a Ti mental layer was used as substrate. The fabricated diamond was evaluated by Raman scattering spectroscopy,X-ray diffraction spectrum(XRD),scanning electron microscopy(SEM). The field emission properties were tested by using a diode structure in a vacuum. A phosphor-coated indium tin oxide(ITO) anode was used for observing and characterizing the field emission. It was found that the diamond microcrystalline films exhibited good electron emission properties. The turn-on field was only 1.15 V/μm,and emission current den⁃sity as high as 0.81 mA/cm2 was obtained under an applied field of 3.35 V/μm. The field emission properties of the diamond microcrystalline films are discussed relating to microstructure and electrical conductivity.关键词
微米金刚石薄膜/场致电子发射/发射点密度/微波等离子体化学气相沉积Key words
diamond microcrystalline films/field emission/emission site densities/chemical vapor deposition分类
通用工业技术引用本文复制引用
高金海,李桢,张武勤,张兵临..微米金刚石薄膜的制备与场发射研究[J].电子器件,2016,(1):12-15,4.基金项目
教育部科学技术重点项目（205091）；河南省高等学校青年骨干教师计划项目（教高〔2011〕550号）；河南省科学技术成果项目 （）
