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Low substrate temperature deposition of transparent and conducting ZnO∶Al thin films by RF magnetron sputtering

Ravindra Waykar Amit Pawbake Rupali Kulkarni Ashok Jadhavar Adinath Funde Vaishali Waman Rupesh Dewan

半导体学报(英文版)2016,Vol.37Issue(4):24-31,8.
半导体学报(英文版)2016,Vol.37Issue(4):24-31,8.DOI:10.1088/1674-4926/37/4/043001

Low substrate temperature deposition of transparent and conducting ZnO∶Al thin films by RF magnetron sputtering

Low substrate temperature deposition of transparent and conducting ZnO∶Al thin films by RF magnetron sputtering

Ravindra Waykar 1Amit Pawbake 1Rupali Kulkarni 1Ashok Jadhavar 1Adinath Funde 1Vaishali Waman 2Rupesh Dewan3

作者信息

  • 1. School of Energy Studies, Savitribai Phule Pune University, Pune 411 007, India
  • 2. Modern College of Arts, Science and Commerce, Shivajinagar, Pune 411 005, India
  • 3. Department of Physics, Savitribai Phule Pune University, Pune 411 007, India
  • 折叠

摘要

关键词

ZnO thin film/substrate temperature/optical properties

Key words

ZnO thin film/substrate temperature/optical properties

引用本文复制引用

Ravindra Waykar,Amit Pawbake,Rupali Kulkarni,Ashok Jadhavar,Adinath Funde,Vaishali Waman,Rupesh Dewan..Low substrate temperature deposition of transparent and conducting ZnO∶Al thin films by RF magnetron sputtering[J].半导体学报(英文版),2016,37(4):24-31,8.

半导体学报(英文版)

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