金刚石与磨料磨具工程2016，Vol.36Issue(2)：24-26,36,4.DOI:10.13394/j.cnki.jgszz.2016.2.0006
纳米金刚石膜真空窗口的制备
Preparation of nanocrystalline diamond film vacuum window
高攀 1马志斌 1吴超 1王传新 1付秋明 1汪建华1
作者信息
- 1. 武汉工程大学 材料科学与工程学院，湖北省等离子体化学与新材料重点实验室，武汉 430073
- 折叠
摘要
Abstract
Anew nanocrystalline diamond film is prepared in C2 H6O∕H2 using self-made microwave plasma chemical vapor deposition(MPCVD) system.The nanocrystalline diamond film is deposited on the surface of (100)-oriented Si wafer.Then a nanocrystalline diamond vacuum window is achieved after the silicon wafer is corroded by a mixture of nitric acid and hydrofluoric acid.The morphology, grain size,microstructure,orientation or texture,and crystalline quality of the diamond samples are characterized by scanning electron microscopy (SEM),X-ray diffraction,micro-Raman spectroscopy, and atomic force microscopy (AFM).The final window has a thickness of 15 μm,with surface roughness of Ra 39.5 nm and grain size of 30 nm.According to self-made leakage rate system,the air leakage rate of this vacuum window is 8.8×10 -9 Pa.m3∕s.关键词
金刚石膜/真空窗口/微波等离子体化学气相沉积/漏气率Key words
diamond film/vacuum window/microwave plasma chemical vapor deposition/air leakage rate分类
信息技术与安全科学引用本文复制引用
高攀,马志斌,吴超,王传新,付秋明,汪建华..纳米金刚石膜真空窗口的制备[J].金刚石与磨料磨具工程,2016,36(2):24-26,36,4.
