金刚石与磨料磨具工程2016，Vol.36Issue(2)：43-48,6.DOI:10.13394/j.cnki.jgszz.2016.2.0010
钎焊金刚石薄壁钻钻磨氮化硅陶瓷孔的试验研究
Research on drill-grinding silicon nitride ceramic with thin-wall brazed diamond drill
丁金 1董海 1白鹤鹏 1张野1
作者信息
- 1. 大连理工大学 机械工程学院，大连 116024
- 折叠
摘要
Abstract
Silicon nitride ceramic was drill-ground with single-layer brazed diamond thin-wall drill.Firstly,the removal mechanism of silicon nitride ceramic was studied,which mainly included brittle removal and ductile regime removal,and brittle removal was the main removal mechanism.Secondly,the influence of wall thickness,spindle speed and drilling pressure on the machining efficiency was studied.The results showed that three parameters all had optimal values,namely 1.5 mm,710 r∕min and 613 N respectively.Wall thickness should not exceed 2 mm,the spindle speed no more than 900 r∕min,and the drilling pressure should be within the range of 500 to 705 N.If the drilling pressure was less than 330 N,the cutting tool would slip.关键词
单层钎焊金刚石薄壁钻/氮化硅陶瓷/去除机理/加工效率Key words
single-layer thin-wall brazed diamond drill/silicon nitride ceramic/removal mechanism/machining efficiency分类
通用工业技术引用本文复制引用
丁金,董海,白鹤鹏,张野..钎焊金刚石薄壁钻钻磨氮化硅陶瓷孔的试验研究[J].金刚石与磨料磨具工程,2016,36(2):43-48,6.
