| 注册
首页|期刊导航|物理学报|VO2薄膜Vis-NIR及NIR-MIR椭圆偏振光谱分析∗

VO2薄膜Vis-NIR及NIR-MIR椭圆偏振光谱分析∗

王盼盼 章俞之 彭明栋 张云龙 吴岭南 曹韫真 宋力昕

物理学报2016,Vol.65Issue(12):127201-1-127201-8,8.
物理学报2016,Vol.65Issue(12):127201-1-127201-8,8.DOI:10.7498/aps.65.127201

VO2薄膜Vis-NIR及NIR-MIR椭圆偏振光谱分析∗

Sp ectroscopic ellipsometry analysis of vanadium oxide film in Vis-NIR and NIR-MIR

王盼盼 1章俞之 1彭明栋 1张云龙 1吴岭南 1曹韫真 1宋力昕1

作者信息

  • 1. 中国科学院上海硅酸盐研究所,中国科学院特种无机涂层重点实验室,上海 200050
  • 折叠

摘要

Abstract

The monoclinic phase (M phase) VO2 film is prepared on quartz glass substrate by a model MSP-3200 three-target co-sputter coater with RF magnetron reactive sputtering. The optical properties in incident energy ranges of 0.5–3.5 eV (350–2500 nm) and 0.083–0.87 eV (1400–15000 nm) of VO2 film are investigated by spectroscopic ellipsometry with variable temperature attachment. The good results are determined point by point with the three Lorentz harmonic oscillator dispersion models in the range of 0.5–3.5 eV and four Gaussion harmonic oscillator dispersion models in the range of 0.083–0.87 eV in the state of semiconductor below the transition temperature, while adding seven Lorentz harmonic oscillator dispersion models in the high temperature metallic state film results in the characteristic absorption peaks. The results show that the refractive index of the semiconductor state of VO2 film is maintained at maximum 3.27 and extinction coefficient k is close to zero in the near infrared-mid infrared, which is due to the fact that the absorption of semiconductor thin film in the VIS-NIR range is derived from the free carrier absorption and d// orbital of the semiconductor film has less electron density. The refractive index n of high temperature metallic state VO2 film has an obviously increasing trend in the near infrared-the mid infrared which is larger than the refractive index of the semiconductor state when the incident light energy is 0.45 eV. Extinction coefficient k increases rapidly in the near infrared, which is because the density of free carrier increases in the range of 0.5–1.62 eV and electron transition absorption augments within the V3d band. When the incident energy less than 0.5 eV, k value changes gently in the film because free carrier concentration and flow rates are stable.

关键词

氧化钒薄膜/相变/椭圆偏振光谱/光学常数

Key words

vanadium oxide films/phase transition/spectroscopy ellipsometry/optical constants

引用本文复制引用

王盼盼,章俞之,彭明栋,张云龙,吴岭南,曹韫真,宋力昕..VO2薄膜Vis-NIR及NIR-MIR椭圆偏振光谱分析∗[J].物理学报,2016,65(12):127201-1-127201-8,8.

基金项目

国家重大科学研究项目(批准号:2009CB939904)资助的课题.@@@@* Project supported by the National Important Scientific Research Projects of China (Grant No.2009CB939904) (批准号:2009CB939904)

物理学报

OA北大核心CSCDCSTPCDSCI

1000-3290

访问量0
|
下载量0
段落导航相关论文