Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion EtchingOAEISCI
Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching
Zhibo Ma;Chengyu Jiang∗;Weizheng Yuan;Yang He
Key Laboratory of Micro/Nano Systems for Aerospace, Ministry of Education, Northwestern Polytechnical University, Xi’an, 710072, ChinaKey Laboratory of Micro/Nano Systems for Aerospace, Ministry of Education, Northwestern Polytechnical University, Xi’an, 710072, ChinaKey Laboratory of Micro/Nano Systems for Aerospace, Ministry of Education, Northwestern Polytechnical University, Xi’an, 710072, ChinaKey Laboratory of Micro/Nano Systems for Aerospace, Ministry of Education, Northwestern Polytechnical University, Xi’an, 710072, China
HydrophobicNanostructure arraysDRIEHigh-aspect-ratio
HydrophobicNanostructure arraysDRIEHigh-aspect-ratio
《纳微快报（英文）》 2013 (1)
7-12,6
This work is supported by NPU Foundation for Fun-damental Research (NPU-FFR-JCY20130120). The authors would like to acknowledge Dr. Jidong Hou and Jie Kong for useful discussions
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