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Thermal Evap oration Dep osition of Few-layer MoS2 Films

Xiying Ma Miaoyuan Shi

纳微快报（英文）2013，Vol.5Issue(2)：135-139,5.

纳微快报（英文）2013，Vol.5Issue(2)：135-139,5.DOI:10.5101/nml.v5i2.p135-139

Thermal Evap oration Dep osition of Few-layer MoS2 Films

Xiying Ma ¹Miaoyuan Shi²

作者信息

1. School of Mathematics and Physics, Suzhou University of Science and Technology, 1# Kerui Road Gaoxin Section, Suzhou 215011, Jiangsu, China
2. Electricity Engineer Department, University of Liverpool, L69 7ZX Liverpool, UK
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摘要

关键词

Monolayer MoS2/Thermal evaporation deposition/Absorption spectrum/I-V behavior

Key words

Monolayer MoS2/Thermal evaporation deposition/Absorption spectrum/I-V behavior

引用本文复制引用

Xiying Ma,Miaoyuan Shi..Thermal Evap oration Dep osition of Few-layer MoS2 Films[J].纳微快报（英文）,2013,5(2):135-139,5.

基金项目

This work was supported in parts by the National Natural Science Foundation of China (No.60976071) and the Scientific Pro ject Program of Suzhou City (No. SYG201121) （No.60976071）

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OAEISCI

ISSN：2311-6706

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