强激光与粒子束2016，Vol.28Issue(10)：101007-1-101007-5,5.DOI:10.11884/HPLPB201628.151108
熔石英元件抛光表面的亚表面损伤研究
Characterization of polishing induced subsurface damages in fused silica optics
摘要
Abstract
Combining HF etching and differential interference contrast microscopy,this paper directly observes and analyzes the subsurface damages in fused silica optics.It is proved that the differential interference contrast microscopy has higher resolu-tion than bright field microscopy and could detect the shallow scratches and dots.It is also revealed that polishing process would introduce lots of subsurface damages which are always covered by the redeposition layer.Most of the subsurface damages are plas-tic deformation induced shallow scratches and dots.A few fracture induced deep scratches and pits also exist.It is deduced that larger polishing particles incline to create severer and more subsurface damages.关键词
熔石英/化学机械抛光/亚表面损伤/微分干涉差显微成像/沉积层Key words
fused silica/chemical mechanical polishing/subsurface damage/differential interference contrast micros-copy/redeposition layer分类
信息技术与安全科学引用本文复制引用
何祥,谢磊,赵恒,马平..熔石英元件抛光表面的亚表面损伤研究[J].强激光与粒子束,2016,28(10):101007-1-101007-5,5.基金项目
国家高技术发展计划项目 （）
