硅酸盐学报2016，Vol.44Issue(9)：1287-1292,6.DOI:10.14062/j.issn.0454-5648.2016.09.06
晶粒尺寸和膜厚对磁控溅射法制备Bi1.5Mg1.0Nb1.5O7薄膜介电性能的影响
Effects of Grain Size and Film Thickness on Dielectric Properties of Bi1.5Mg1.0Nb1.5O7 Thin Films Prepared by Radio-Frequency Magnetron Sputtering
摘要
Abstract
Bi1.5MgNb1.5O7 (BMN) thin films with a cubic pyrochlore structure were prepared on Pt/Ti/SiO2/Si substrates via radio-frequency (RF) magnetron sputter deposition. The grain size and thickness of the thin films were controlled via the change of post-annealing time at 750 ℃ and the sputtering time, respectively. The effects of grain size and film thickness on the phase compositions, microstructures and dielectric properties of BMN thin films were investigated. As the average grain size and thickness of BMN thin films increase to 45 nm and 430 nm, respectively, the dielectric properties of the thin films improve, and the resultant films have a dielectric constant of 112.4, a low dielectric loss of 0.001 82 at 1 MHz, and a maximum tunability of 27.7%at the bias electric field of 0.93 MV/cm. These results indicate that the BMN thin films could be used as a promising material for tunable device applications due to their high tunability at low bias fields.关键词
铌镁酸铋薄膜/磁控溅射/晶粒尺寸/膜厚/介电性能/调谐率Key words
bismuth magnesium niobium thin film/magnetron sputtering/grain size/thickness/dielectric properties/tunability分类
土木建筑引用本文复制引用
晏子敬,吕忆农,刘云飞,高虹,马成建,蒋晓威..晶粒尺寸和膜厚对磁控溅射法制备Bi1.5Mg1.0Nb1.5O7薄膜介电性能的影响[J].硅酸盐学报,2016,44(9):1287-1292,6.基金项目
江苏高校优势学科建设工程资助项目(PAPD)；长江学者和创新团队发展计划(IRT1146)资助。 （PAPD）
