硅酸盐学报2016，Vol.44Issue(9)：1357-1364,8.DOI:10.14062/j.issn.0454-5648.2016.09.17
介孔氧化硅微球的合成及其在化学机械抛光中的应用
Synthesis of Mesoporous Silica Microspheres and Their Application in Chemical Mechanical Polishing
摘要
Abstract
The mesoporous silica (Sm) microspheres with radial channels were prepared via a developed Stöber method and the self-assembly of anionic surfactant (cetyltrimethylammonium bromide) micelles with silica precursors (tetraethoxysilane). The results indicate that the particle sizes of the Sm microspheres range from ca. 260 to 480 nm, and the Brunauer-Emmett-Teller specific surface areas are 1 300–1 500 m2/g and the mesochannel sizes are in a range of 2–3 nm. The chemical mechanical polishing characteristics of Sm and solid silica (Ss) particle abrasives for oxidized silicon substrates were investigated by atomic force microscopy. The root-mean-square surface roughness (RMS) of the substrate after polishing with Sm abrasives is 0.240 nm, and the topographical variation is ±0.70 nm and the material removal rate (MRR) is 93 nm/min. Compared to the Ss particles, the as-synthesized Sm particles can be used to further decrease the surface roughness, increase the material removal rate and eliminate the surface mechanical damage.关键词
介孔氧化硅/微球/磨料/化学机械抛光Key words
mesoporous silica/microsphere/abrasive/chemical mechanical polishing引用本文复制引用
陈爱莲,秦佳伟,陈杨..介孔氧化硅微球的合成及其在化学机械抛光中的应用[J].硅酸盐学报,2016,44(9):1357-1364,8.基金项目
国家自然科学基金(51205032，51405038，51575058)资助。 （51205032，51405038，51575058）
