液晶与显示2016，Vol.31Issue(9)：877-881,5.DOI:10.3788/YJYXS20163109.0877
球状微米金刚石的制备过程及其场发射性能的研究
Preparation process and field emission properties of globular micron diamond
摘要
Abstract
A layer of thick metal titanium is plated on the flat ceramic substrate by the method of mag-netron sputtering.After processing,the surface defect of metal titanium layer put in the cavity of mi-crowave plasma chemical vapor deposition.Using the method of orthogonal experiment,the thin film of best emission is prepared.By scanning electron microscopy,X-ray diffraction instrument,Raman spectroscopy instrument,the thin film is analyzed.The conclusion of the film is globular micron dia-mond film.And the film mechanism of field emission is studied.关键词
球状微米金刚石薄膜/场致电子发射/微波等离子体化学气相沉积Key words
globularmicron diamond films/field emission/chemical vapor deposition分类
通用工业技术引用本文复制引用
高金海,张武勤,李桢,张兵临..球状微米金刚石的制备过程及其场发射性能的研究[J].液晶与显示,2016,31(9):877-881,5.基金项目
教育部科学技术重点资助项目(No．205091) （No．205091）
河南省科学技术成果项目(教高豫科鉴委字〔2015〕第569号) （教高豫科鉴委字〔2015〕第569号）
河南省高等学校重点科研项目(项目编号:16A140039)Supported by Ministry of Education of Science and Technology Key Projects(No．205091) （项目编号:16A140039）
Henan Province Scientific and Technological Achievements Project(No．〔2015〕569) （No．〔2015〕569）
Colleges and Universities in Henan Province Key Scientific Research Project(No．16A140039) （No．16A140039）
