发光学报2016，Vol.37Issue(9)：1114-1123,10.DOI:10.3788/fgxb20163709.1114
射频磁控溅射法制备SnS薄膜及其结构和光学特性
Structural and Optical Properties of SnS Films Prepared by RF Magnetron Sputtering
摘要
Abstract
SnS thin films were prepared on glass substrates by RF magnetron sputtering technique and then were rapidly annealed. The crystalline structure, phase composition, chemical composi-tion , surface morphology and relevant optical properties of SnS thin films grown under various sputte-ring power (60-120 W) are investigated by X-ray diffraction ( XRD) , Raman spectroscopy ( Ra-man) , energy dispersive X-ray spectroscopy ( EDS) , atomic force microscopy ( AFM) and ultravio-let-visible-near infrared spectrophotometry ( UV-Vis-NIR) . The results show that all the rapidly an-nealed thin films are crystallized. The crystalline quality, degree of preferential orientation and stoi-chiometry of thin films are improved and the average particle sizes of thin films are enlarged by the increase of sputtering power. Under the condition of sputtering power of 100 W, the sample has high crystalline quality and degree of preferential orientation, the least strain, pure-phase SnS thin film, Sn/S mole ratio of 1∶1. 09, the absorption coefficient of 105 cm-1 and the direct band-gap of 1. 54 eV.关键词
SnS薄膜/射频磁控溅射/快速退火/晶体结构/光学特性Key words
SnS thin film/RF magnetron sputtering/rapid thermal annealing/crystalline structure/optical properties分类
信息技术与安全科学引用本文复制引用
刘丹丹,李学留,李琳,史成武,梁齐..射频磁控溅射法制备SnS薄膜及其结构和光学特性[J].发光学报,2016,37(9):1114-1123,10.基金项目
国家自然科学基金(51272061)资助项目 （51272061）
