强激光与粒子束2016，Vol.28Issue(12)：123003-1-123003-5,5.DOI:10.11884/HPLPB201628.160434
强流多注电子束高效率引入的模拟研究
PIC simulation of high efficient injection of intense relative multi-beam
摘要
Abstract
This paper presents a simulation study on intense relative multi-beams(IRMBs)electron explosive emission and structure optimizing of cathodes in the relative klystron amplifier(RKA)diode with PIC simulation software.Three new kinds of structures for multi-beam cathodes are introduced.The result shows that,the traditional structure cathode could only get the injection coefficient of IRMBs up to 82%,while the new structure cathode could increase it to more than 95%,even 99%.This research gives a solution to the problem of low injection coefficient in the multi-beams RKA.关键词
多注速调管/强流多注电子束/阴极结构/二极管/引入效率Key words
multi-beam klystron/intense multiple electron beams/cathode structure/diode/inj ection coefficient分类
信息技术与安全科学引用本文复制引用
李乐乐,黄华,刘振帮,王淦平,袁欢..强流多注电子束高效率引入的模拟研究[J].强激光与粒子束,2016,28(12):123003-1-123003-5,5.基金项目
国家自然科学基金项目(11475158) （11475158）
中国工程物理研究院发展基金项目(2014B0402068) （2014B0402068）
