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微孔阵列铜表面二次电子发射系数抑制研究

王泽卫 叶鸣 陈亮 贺永宁 崔万照 张忠兵

强激光与粒子束2016,Vol.28Issue(12):124002-1-124002-7,7.
强激光与粒子束2016,Vol.28Issue(12):124002-1-124002-7,7.DOI:10.11884/HPLPB201628.160079

微孔阵列铜表面二次电子发射系数抑制研究

Study on secondary electron yield suppression of copper by micro-hole array

王泽卫 1叶鸣 2陈亮 3贺永宁 2崔万照 4张忠兵3

作者信息

  • 1. 西安电子科技大学 先进材料与纳米科技学院,西安 710126
  • 2. 西安交通大学 电子与信息工程学院,西安 710049
  • 3. 西北核技术研究所 辐射探测科学研究中心,西安 710024
  • 4. 中国空间技术研究院西安分院 空间微波技术国防科技重点实验室,西安 710100
  • 折叠

摘要

Abstract

It is of great importance to reduce secondary electron yield (SEY)of metals in order to improve performance of e-lectronic vacuum devices.This paper focuses on the experimental study on SEY suppression of copper.First,by using the Casino software,the SEY of square hole array surface was simulated under normal incident primary electron with energy of 0.5,3 keV respectively.The aspect ratio and porosity dependence of the intrinsic SEY (ISEY),backscattered SEY (BSEY)and total SEY (TSEY)were obtained.Second,by using the photolithography process in semiconductor industry,various circular hole arrays were fabricated on copper foil and their surface morphology were characterized using a laser scanning microscope,their SEY were measured on SEY test platform.Simulation results show that:with increasing aspect ratio and porosity,the SEY suppression effect can be enhanced;when aspect ratio is becoming large enough,the SEY tend to be saturated;the SEY suppression effect is more obvious when incident energy is low.Measurement results show that the micro-hole array surface can effectively suppress the SEY of copper and experimental results agrees qualitatively with simulation results.

关键词

二次电子抑制/微孔阵列/Casino 模拟/

Key words

secondary electron suppression/micro-hole array/Casino simulation/copper

分类

数理科学

引用本文复制引用

王泽卫,叶鸣,陈亮,贺永宁,崔万照,张忠兵..微孔阵列铜表面二次电子发射系数抑制研究[J].强激光与粒子束,2016,28(12):124002-1-124002-7,7.

基金项目

国家自然科学基金项目 ()

强激光与粒子束

OA北大核心CSCD

1001-4322

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