湖北文理学院学报2016，Vol.37Issue(11)：35-38,4.
用于低温生长石墨烯的微波等离子体辅助化学气相沉积系统
Microwave Plasma Assisted Chemical Vapor Deposition System for Synthesis of Graphene at Low Temperature
陈鑫耀1
作者信息
- 1. 集美大学 理学院，福建 厦门 361021; 厦门大学 物理科学与技术学院，福建 厦门 361005
- 折叠
摘要
Abstract
Chemical vapor deposition (CVD) is one of the important thin film preparation processes, in which the microwave plasma assisted chemical vapor deposition ( MP-CVD) is widely used in the preparation of nano-functional film, hard-coating film and optical film. In this paper, a universal type of 2.45 GHz MP-CVD system is introduced, including details of hardware configuration, control software. At last, high-quality graphene film prepared at low temperature by this system is showed.关键词
化学气相沉积/微波等离子体/石墨烯薄膜Key words
Chemical vapor deposition/Microwave plasma/Graphene films分类
信息技术与安全科学引用本文复制引用
陈鑫耀..用于低温生长石墨烯的微波等离子体辅助化学气相沉积系统[J].湖北文理学院学报,2016,37(11):35-38,4.
