厦门大学学报（自然科学版）2016，Vol.55Issue(6)：881-887,7.DOI:10.6043/j.issn.0438-0479.201601001
SiO2/Si衬底上Au纳米颗粒制备的研究
The Preparation of Gold Nanoparticles on SiO2/Si Substrate
摘要
Abstract
Gold (Au)nanoparticles are fabricated on SiO2/Si substrate by the combination of radio frequency magnetron sputtering and rapid thermal annealing.Effects of the sputtering condition and the annealing temperature on the size and the distribution of Au nanoparticles are investigated.Results show that samples with discrete-and small-sized Au nanoparticles after sputtering deposition enjoy high thermal stabilities.By contrast,for samples with continuous Au film,the size of Au nanoparticles change non-monotonicity with the increase of annealing temperatures.This phenomenon can be attributed to the existence of two competing mechanisms, namely,the relaxation of stress and surface energy minimization during annealing processes.Finally,the high number density (1.1 × 1012 cm-2 )and small sizes (<5 nm)of Au nanoparticles are achieved by the decrease of sputtering power,offering guides for the ap-plication to metal nanocrystal semiconductor memory.关键词
Au纳米颗粒/射频磁控溅射/快速热退火Key words
Au nanoparticle/radio frequency magnetron sputtering/rapid thermal annealing分类
数理科学引用本文复制引用
许怡红,王尘,韩响,赖淑妹,陈松岩..SiO2/Si衬底上Au纳米颗粒制备的研究[J].厦门大学学报（自然科学版）,2016,55(6):881-887,7.基金项目
国家自然科学基金(61474081,61534005) （61474081,61534005）
