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一种新型的SOI MOSFET衬底模型提取方法

周文勇 刘军 汪洁

电子器件2016,Vol.39Issue(6):1302-1308,7.
电子器件2016,Vol.39Issue(6):1302-1308,7.DOI:10.3969/j.issn.1005-9490.2016.06.005

一种新型的SOI MOSFET衬底模型提取方法

A New Substrate Model Extraction Method for RF SOI MOSFET

周文勇 1刘军 1汪洁1

作者信息

  • 1. 杭州电子科技大学"射频电路与系统"教育部重点实验室,杭州310027
  • 折叠

摘要

Abstract

Substrate parasitic network modeling and parameter extraction have significant influence on the model?ing of output characteristics for RF SOI MOSFET devices. The isolation between the introducing bulk region of the BOX layer and the Si substrate is considered. The traditional common-source structure that connecting source , body and substrate together to ground couldn ''t distinguish the substrate parasitic network with the active region. An improved test structure was proved to extract the substrate parasitic parameters by connecting the drain and source as output port and gate as input port. An accurate substrate modeling method based on different fingers was developed to build SOI MOSFETs models. The simulating S parameter matched the measured result quite well under 20 GHz.

关键词

RFSOIMOSFET/衬底模型/测试结构/参数提取

Key words

RF SOI MOSFET/substrate model/test structure/parameter extraction

分类

信息技术与安全科学

引用本文复制引用

周文勇,刘军,汪洁..一种新型的SOI MOSFET衬底模型提取方法[J].电子器件,2016,39(6):1302-1308,7.

基金项目

浙江省自然科学基金项目(LY13F040005) (LY13F040005)

电子器件

OA北大核心CSTPCD

1005-9490

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