电子学报2016，Vol.44Issue(12)：2960-2966,7.DOI:10.3969/j.issn.0372-2112.2016.12.021
基于工艺参数扰动的IC参数成品率多目标优化算法
A MuIti-objective Opti mization Framework for Robust IC Parametric YieId Predication Under Process Variations
李鑫 1孙晋 2肖甫 3田江山4
作者信息
- 1. 江苏省安全生产科学研究院科技研发中心，江苏南京210042
- 2. 南京邮电大学江苏省无线传感网高技术研究重点实验室，江苏南京210013
- 3. 南京理工大学计算机科学与工程学院，江苏南京210094
- 4. 南京邮电大学江苏省无线传感网高技术研究重点实验室，江苏南京210013
- 折叠
摘要
Abstract
Process variations lead to a significant degradation of IC parametric yield,and they also tend to cause a nega-tive correlation between different parametric yields.However,previous yield optimization works are limited to deal with single objective problem.To deal with the above-mentioned limitation,this paper proposes a multi-objective optimization framework for co-optimization of power and timing yields under process variations.The proposed method starts with establishing explicit statistical models for power and timing metrics respectively.Then considering the negative correlation between the metrics,we employ Chebyshev affine arithmetic to formulate a multi-objective optimization model,optimize power and timing yields sim-ultaneously by adaptive weighted sum method,and provide a well-distributed set of Pareto-optimal solutions.Experimental re-sults demonstrate that the proposed method explores about 30 well-distributed solutions for each benchmark circuit with differ-ent test units.In addition,it can not only balance the restricted correlation between multiple optimization objectives,but make the traditional weighted sum method to get optimal solutions on the Pareto curve where change rate is small.关键词
可制造性设计/参数成品率/统计建模/多目标优化/帕累托最优Key words
design for manufacturability/parametric yield/statistical modeling/multi-objective optimization/Pareto op-timality分类
信息技术与安全科学引用本文复制引用
李鑫,孙晋,肖甫,田江山..基于工艺参数扰动的IC参数成品率多目标优化算法[J].电子学报,2016,44(12):2960-2966,7.
