金刚石与磨料磨具工程2016，Vol.36Issue(6)：15-19,24,6.DOI:10.13394/j.cnki.jgszz.2016.6.0004
热丝 CVD 金刚石涂层温度场补偿优化研究
Optimization of HFCVD diamond coating deposition temperature compensating
摘要
Abstract
In the process of the diamond coating deposition of hot filament chemical vapor deposition HFCVD the precise control of temperature distribution especially the temperature of substrate is one of the main problems affect the quality of diamond film The paper proposes a temperature compensating device to improve the temperature distribution based on HF–650.Arranging reflective plates on and surrounding the substrate improves the distribution of temperature by thermal reflection Simulation by Fluent and test by improved device will be used to verify the improvement It is shown that the compensating device can uniform the temperature distribution of HFCVD reducing temperature fluctuate from 9 3% to 3 0% which has been proved by practice With the device high quality diamond film that I D I G =4 33 has been prepared which is positive for diamond deposition.关键词
金刚石薄膜/温度场优化/热反射Key words
diamond film/temperature distribution improvement/thermal reflection分类
化学化工引用本文复制引用
简小刚,雷强,张奎林..热丝 CVD 金刚石涂层温度场补偿优化研究[J].金刚石与磨料磨具工程,2016,36(6):15-19,24,6.基金项目
国家自然科学基金资助(51275358) （51275358）
中央高校专项基金资助(20140750)。 （20140750）
