液晶与显示2017，Vol.32Issue(3)：169-176,8.DOI:10.3788/YJYXS20173203.0169
超高色域图案化量子点彩膜的研究
Ultro-high color gamut and patterned color filter based on quantum dot photoresist
齐永莲 1石广东 1王丹 1邱云 1张斌 1周婷婷 1谢蒂旎 1薛建设 1赵合彬 1曲连杰1
作者信息
- 1. 京东方科技集团股份有限公司 显示器件事业群, 北京 100176
- 折叠
摘要
Abstract
The spectra of color filter and back light are important factors that affect color gamut in display area.In order to achieve higher color gamut (BT2020) in TFT-LCD area, we developed a novel quantum dot resist which can displace color filter and improve color pure.This quantum dot resist could be patterned through photo process including cleaning, coating, exposure, developing and post bake.The result indicates that quantum dot resist can achieve higher color gamut than quantum dot BLU.关键词
量子点/光刻胶/图案化/高色域/显示Key words
quantum dot/photo resist/pattern/high color gamut/display分类
信息技术与安全科学引用本文复制引用
齐永莲,石广东,王丹,邱云,张斌,周婷婷,谢蒂旎,薛建设,赵合彬,曲连杰..超高色域图案化量子点彩膜的研究[J].液晶与显示,2017,32(3):169-176,8.
