无机材料学报2017，Vol.32Issue(3)：287-292,6.DOI:10.15541/jim20160312
钛掺杂三氧化钨薄膜结构与电致变色性能研究
Structure and Electrochromic Properties of Titanium-doped WO3Thin Film by Sputtering
彭明栋 1章俞之 2宋力昕 1尹小富 1王盼盼 1吴岭南 2胡行方1
作者信息
- 1. 中国科学院上海硅酸盐研究所,中国科学院特种无机涂层重点实验室,上海200050
- 2. 中国科学院大学,北京100049
- 折叠
摘要
Abstract
Pure and Ti-doped WO3 thin films prepared by RF (radio-frequency) magnetron at room temperature were determined by XRD, Raman and SEM to analyze the micro-structure and the morphology of the films. In addition, elec-trochemical workstation and UN-Vis-NIR spectrophotometer were used to measure their cycling stability and optical property. Research results showed that Ti doping had little interference with the surface morphology and optical constants, but the film crystallization temperature could be increased by Ti doping. Electrochemical test results showed that Ti dop-ing could improve reversibility of ion injection and extraction, and improve cycling performance of films. Meanwhile, the switching speed and optical modulation performance of films were enhanced. In detail, the switching time of colored and bleached states were shortened from 9.8 s and 3.5 s to 8.4 s and 2.7 s, respectively. Therefore, Ti doped WO3 thin films has better electrochromic properties.关键词
电致变色/钛掺杂/氧化钨薄膜/结构Key words
electrochromic/titanium-doped/WO3 thin films/structure分类
化学化工引用本文复制引用
彭明栋,章俞之,宋力昕,尹小富,王盼盼,吴岭南,胡行方..钛掺杂三氧化钨薄膜结构与电致变色性能研究[J].无机材料学报,2017,32(3):287-292,6.
