液晶与显示2017，Vol.32Issue(2)：104-109,6.DOI:10.3788/YJYXS20173202.0104
载盘预处理对纯铝薄膜小丘生成的影响
Effect of pretreatment of tray on hillock formation in pure Al films
肖亮 1张勋泽 1朴祥秀1
作者信息
- 1. 合肥京东方光电科技有限公司,安徽合肥230012
- 折叠
摘要
Abstract
In production of pure Al film in TFT array,hillock which will seriously affect the electrical properties and yield of the products often forms around the glass substrate after replacing the cleaning spare parts of the trays.In factory,a method is shown to quickly identify and compare the formation of hillock,which include using a commonly used machine on the production line called array macro-micro defect inspection machine to observe the surface of pure Al film and then save the pictures which will be analyzed and calculated by MATLAB.In this paper,orthogonal and single experiments are designed with the possible influential factors of hillock formation,which are the thickness of pure Al film,the time of pretreatment of tray and the pause time of the glass substrate after deposition of pure Al film in heater chamber.It is found that the main factor of hillock formation is the time of pretreatment of tray.The pure Al film with none hillock can be obtained when the thicknesses of pure Al film and Mo protective layer are 300 nm and 80 nm,the time of pretreatment of tray is over 90 min and the substrate have no pause in the heater chamber after deposition of pure Al film,which is meaningful to prevent the hillock formation caused by the replacement of cleaning spare parts et al.in pure Al film production.关键词
纯铝薄膜/小丘/MATLAB/磁控溅射/残余气体Key words
pure Al films/hillock/MATLAB/magnetron sputtering/residual gas分类
通用工业技术引用本文复制引用
肖亮,张勋泽,朴祥秀..载盘预处理对纯铝薄膜小丘生成的影响[J].液晶与显示,2017,32(2):104-109,6.
