材料科学与工程学报2017，Vol.35Issue(2)：224-227,4.DOI:10.14136/j.cnki.issn 1673-2812.2017.02.011
低折射率疏水SiO2薄膜的制备和表征
Preparation of Hydrophobic Anti-reflective Silica Film with Low Refractive Index
摘要
Abstract
To prepare hydrophobic anti-reflective silica film with low refractive index,sol was first prepared through hydrolysis and condensation of tetraethoxysilane (TEOS) and dimethyldiethoxylsilane (DDS)under ammonia catalysis.The sol was then further modified with hexamethyldisilazane (HMDS),with which one-layer anti-reflective film was preparaed using dip-coating technology on a glass substrate.The rule of viscosity change with aging time and effect of HMDS addition on contact angle were analyzed and investigated,and the film with the largest contact angle and low refractive index was thus obtained.Meanwhile Infrared property,transmittance,refractive index of the film have been characterized.The results showed that the hydrophobicity can be improved by hydrolysis and co-condensation reactions of TEOS and DDS,and the contact angle of the film is 149°and the refractive index is 1.12 after modification.关键词
溶胶-凝胶/疏水/折射率/改性Key words
sol-gel/hydrophobic/refractive index/modification分类
数理科学引用本文复制引用
姜洪义,郑威,海鸥,李明,徐东..低折射率疏水SiO2薄膜的制备和表征[J].材料科学与工程学报,2017,35(2):224-227,4.基金项目
佛山市科技发展基金资助项目(03040041) （03040041）
