华中师范大学学报（自然科学版）2017，Vol.51Issue(2)：162-167,6.
基于液滴锡靶LPP-EUVL光源多层膜的溅射损伤研究
Sputtering damage of multilayer coatings for LPP-EUVL light source based on Sn droplet target
摘要
Abstract
Based on the self-similar solution of Navier-Stokes equations,properties of fast ion debris emitted from laser-produced mass-limited plasma had been theoretically investigated for an application to extreme ultraviolet lithography (EUVL).Using numerical technology,the average ionization degree,the plasma plume size,the expansion velocity and the ion kinetic energy evolutions for three values of adiabatic exponent γ=1.67,1.3 and 1.1 were presented.The angular distribution of fast ion debris fluxes and erosion rates due to sputtering yield for Ru,Mo,and Si under tin ion bombardment were calculated.It was found that angle dependence of the erosion rate due to sputtering yields Y of Si and Mo with Sn showed cos3θ profiles.The formation of low ionization degree and minimum-mass plasma for EUV sources are expected to result in a significant increase in the collector mirror lifetime.关键词
激光等离子体/自相似膨胀/离子碎屑/溅射产额/极紫外光刻Key words
laser produced plasma/self-similar expansion/ion debris/sputtering yield/EUVL分类
数理科学引用本文复制引用
吴涛,姚拴..基于液滴锡靶LPP-EUVL光源多层膜的溅射损伤研究[J].华中师范大学学报（自然科学版）,2017,51(2):162-167,6.基金项目
国家自然科学基金项目(11304235) （11304235）
武汉工程大学校长基金项目(2014067) （2014067）
武汉工程大学科学研究基金项目(K201310). （K201310）
