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首页|期刊导航|无机材料学报|MBE技术蓝宝石衬底上生长VO2薄膜及其太赫兹和金属-绝缘体相变特性研究

MBE技术蓝宝石衬底上生长VO2薄膜及其太赫兹和金属-绝缘体相变特性研究

孙洪君 王敏焕 边继明 苗丽华 章俞之 骆英民

无机材料学报2017,Vol.32Issue(4):437-442,6.
无机材料学报2017,Vol.32Issue(4):437-442,6.DOI:10.15541/jim20160456

MBE技术蓝宝石衬底上生长VO2薄膜及其太赫兹和金属-绝缘体相变特性研究

Terahertz and Metal-insulator Transition Properties of VO2 Film Grown on Sapphire Substrate with MBE

孙洪君 1王敏焕 1边继明 1苗丽华 2章俞之 1骆英民2

作者信息

  • 1. 大连理工大学 三束材料改性教育部重点实验室,物理与光电工程学院,大连 116024
  • 2. 中国科学院 上海硫酸盐研究所 中国科学院特种无机涂层重点实验室,上海 200050
  • 折叠

摘要

Abstract

High quality stoichiometric VO2 films were grown on single crystal sapphire substrates by molecular beam epitaxy (MBE),the film thicknesses were precisely controlled on the nanoscale ranging from 15 nm to 60 nm.For the optimized sample,a distinct reversible metal-insulator transition (MIT) with abrupt resistance change more than four orders of magnitude was observed,which was comparable to the ever reported result for high quality single crystal VO2.Especially,the optical properties in the terahertz (THz) frequency range were characterized with THz time-domain spectroscopy (THz-TDs)measurements for samples with various thicknesses,and the results indicate that the THz properties of VO2 film was significantly affected by the thickness.Therefore,the thickness should to be precisely controlled to obtain reproducible and reliable performance.The THz devices based on VO2 film may benefit significantly from these achievements.

关键词

二氧化钒薄膜/太赫兹时域光谱/分子束外延/金属-绝缘体相变

Key words

vanadium dioxide film/terahertz time-domain spectroscopy (THz-TDs)/molecular beam epitaxy (MBE)/metal-insulator transition

分类

通用工业技术

引用本文复制引用

孙洪君,王敏焕,边继明,苗丽华,章俞之,骆英民..MBE技术蓝宝石衬底上生长VO2薄膜及其太赫兹和金属-绝缘体相变特性研究[J].无机材料学报,2017,32(4):437-442,6.

基金项目

Fundamental Research Funds for the Central Universities (DUT16LAB11) (DUT16LAB11)

Opening Project of Key Laboratory of Inorganic Coating Materials,Chinese Academy of Sciences (KLICM-2014-01) (KLICM-2014-01)

无机材料学报

OA北大核心CSCDCSTPCDSCI

1000-324X

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