大连工业大学学报2017，Vol.36Issue(2)：106-108,3.
化学气相沉积法硅薄膜的制备及其性能
Preparation and properties of silicon films by CVD
孙家祥 1徐同宽 1刘彦军1
作者信息
- 1. 大连工业大学轻工与化学工程学院,辽宁大连 116034
- 折叠
摘要
Abstract
A layer of compact silicon film was prepared on the surface of stainless steel using chemical vapor deposition technology.The effects of reaction temperature and SiH4 pressure on the chemical properties of silicon film were also studied.An energy-dispersive spectroscopy of the silicon film was analyzed and the microscopic morphology of silicon film was characterized by SEM.The effect of silicon film on anti-corrosive properties of stainless steel was explored by the electrochemical analysis of the stainless steel coated with silicon film.The results showed that the corrosion resistance of silicon film was best when the temperature was 390 ℃ and the pressure of the SiH4 was 10 kPa.关键词
硅薄膜/防腐性/化学气相沉积Key words
silicon film/corrosion resistance/chemical vapor deposition分类
通用工业技术引用本文复制引用
孙家祥,徐同宽,刘彦军..化学气相沉积法硅薄膜的制备及其性能[J].大连工业大学学报,2017,36(2):106-108,3.
