硅酸盐通报2017，Vol.36Issue(4)：1149-1153,5.
7003铝合金CMP后表面SiO2纳米颗粒清洗研究
SiO2 Nanoparticles Removal from 7003 Aluminum Alloy Surface in Post-CMP Cleaning
摘要
Abstract
With the wet chemical cleaning method and ultrasonic in the weak acid aqueous solution, the cleaning of the 7003 aluminum alloy surface after chemical mechanical polishing (CMP) was investigated.The cleaning slurry are mainly composed of the non-ionic surfactant, polyoxyethylene octylphenyl ether, and corrosion inhibitors, disodium dihydrogen pyrophosphate and benzotriazole (BTA).With scanning electron microscope (SEM) and atomic force microscope (AFM) analysis, it is found that polyoxyethylene octylphenyl ether could keep SiO2 particles in the state of physical adsorption which could easily be removed from the surface, combining with ultrasonic synergy.With the increasing mass fraction of surfactant, particles removal efficiency gradually improved.When the mass fraction increased to 2%, the SiO2 particles remaining on the surface are substantially removed, and no corrosion phenomenon happens.Besides these, surfactant layer was formed on surface after cleaning, which could prevent the particles adsorption again.关键词
7003铝合金/SiO2颗粒/非离子表面活性剂/清洗Key words
7003 aluminum alloy/SiO2 particle/non-ionic surfactant/clean分类
信息技术与安全科学引用本文复制引用
吴中华,卞达,赵永武..7003铝合金CMP后表面SiO2纳米颗粒清洗研究[J].硅酸盐通报,2017,36(4):1149-1153,5.基金项目
国家自然科学基金(51675232) （51675232）
