无机材料学报2017，Vol.32Issue(5)：555-560,6.DOI:10.15541/jim20160464
La掺杂对磁控溅射CaB6薄膜的影响
Effects of La Doping on CaB6 Thin Films Prepared by DC Magnetron Sputtering
摘要
Abstract
Both La doped and undoped Ca1-xLaxB6 (x =0,0.01,0.02,0.03) thin films were prepared by direct current magnetron sputtering method.Morphology and thickness of these films were characterized by atomic force microscopy.Thicknesses of doped films were about twice that of the undoped films,while the grain growth of the film was much enhanced by La doping.X-ray photoelectron spectroscopy (XPS) was used for investigating the chemical composition of film surfaces.Calculated La/Ca atomic ratios were close to the theoretical values,and there were no other ferromagnetic impurities or elements especially iron existing in films.Ca0.98La0.02B6 films exhibited the highest room temperature saturation magnetization 84.54 emu/cm3.The saturation magnetization decreased with increasing film thickness.B6 vacancies may be the main source of magnetism.Other defects such as grain boundaries also affected the magnitude of magnetism.关键词
CaB6/薄膜/La掺杂量/磁性Key words
CAB6/thin film/La doping concentration/magnetism分类
通用工业技术引用本文复制引用
张琳,刘慧慧,刘林佳,赵国庆,吴艳,闵光辉..La掺杂对磁控溅射CaB6薄膜的影响[J].无机材料学报,2017,32(5):555-560,6.基金项目
National Natural Science Foundation of China (51102154),Fundamental Research Funds of Shandong University (2015JC033) （51102154）
