| 注册
首页|期刊导航|金刚石与磨料磨具工程|不同碳源浓度下热丝CVD金刚石薄膜的惰性示踪气体发射光谱法研究

不同碳源浓度下热丝CVD金刚石薄膜的惰性示踪气体发射光谱法研究

范咏志 王传新 易成 代凯 许青波 马志斌 吴超

金刚石与磨料磨具工程2017,Vol.37Issue(1):25-28,33,5.
金刚石与磨料磨具工程2017,Vol.37Issue(1):25-28,33,5.DOI:10.13394/j.cnki.jgszz.2017.1.0005

不同碳源浓度下热丝CVD金刚石薄膜的惰性示踪气体发射光谱法研究

Trace rare gases OES: nonintrusive method for the process of CVD diamond film growth under different carbon source

范咏志 1王传新 2易成 1代凯 2许青波 1马志斌 2吴超1

作者信息

  • 1. 武汉工程大学材料科学与工程学院,武汉430073
  • 2. 湖北省等离子体化学与新材料重点实验室,武汉430073
  • 折叠

摘要

Abstract

The diamond films were prepared by hot filament chemical vapor deposition.Trace rare gases optical emission spectroscopy (OES) was used to measure the active species during the diamond growth.The quality and morphology of grown diamond films were characterized by SEM and Raman spectra.When the other parameters were kept constant,with the increasing gas flux of the carbon source,the electron temperature generally decreased.However,if the carbon source flow was between 50 cm3/min and 70 cm3/min there appeared an abnormal situation,which was to first increase and then decline,maximum peak at the vicinity of 60 cm3/min,when the charged particles reached the substrate with the maximum flux and energy.Meanwhile,the content of carbon-containing groups,such as CO,C2 and CH,was at there minimum value near vicinity of 60 cm3/min minimum.Vapor depositing process went towards the direction to grow diamond film,with maximum growth rate.However,the quality of diamond films decreased as the concentration of carbon source increased.

关键词

化学气相沉积/金刚石薄膜/光谱诊断/惰性示踪气体

Key words

chemical vapor deposition/diamond film/optical emission spectroscopy/trace rare gases

分类

化学化工

引用本文复制引用

范咏志,王传新,易成,代凯,许青波,马志斌,吴超..不同碳源浓度下热丝CVD金刚石薄膜的惰性示踪气体发射光谱法研究[J].金刚石与磨料磨具工程,2017,37(1):25-28,33,5.

基金项目

国家自然科学基金(11575134)资助项目 (11575134)

武汉工程大学研究生教育创新基金(CX2015006). (CX2015006)

金刚石与磨料磨具工程

OA北大核心CSTPCD

1006-852X

访问量0
|
下载量0
段落导航相关论文