表面技术2017，Vol.46Issue(5)：255-260,6.DOI:10.16490/j.cnki.issn.1001-3660.2017.05.041
哈氏合金C-276电抛光中抛光液的失效分析
Failure Analysis of Electrolyte in E-polishing Process of Hastelloy Alloy C-276
摘要
Abstract
Hastelloy alloy C-276 strip has been widely used as metallic substrate of YBCO second generation high temperature su-perconductor. The alloy is subject to strict requirements regarding surface polishing quality (roughness Ra in the work). Electrochemical polishing agent shall be controlled effectively and analyzed for variation and failure to guarantee polishing quality. With C-276 strip as object of study, non-contact electrochemical polishing method as well as instruments including SEM, AFM, metallographic microscope and microwave plasma atomic emission spectrometer were used. Functions and process requirements of main components including H3PO4 and H2SO4 in polishing agent were elaborated. Content of H3PO4 and H2SO4, and ionic concentration of Ni, Cr and Mo were measured after unit volume polishing agent passes through electric quantity in certain period (Ah/L). C-276 strip surface roughness will not meet the process requirements Ra <1 nm (5 μm× 5 μm) unless content of phosphoric acid and sulfuric acid fell within 775~1013 g/L and 318~451 g/L, ionic concentration of Ni, Cr, Mo was<7.3 g/L, 2.7 g/L, 3.4 g/L, respectively. Non-contact electrochemical po- lishing is used to achieve continuous production of the second-generation high-temperature superconducting tapes of kilometric Hastel-loy based on effective control of sulfuric acid, phosphoric acid, additives and metal ion concentration in electrochemical polishing agent. The surface roughness Ra is < 1 nm.关键词
哈氏合金/电化学抛光/抛光液/粗糙度Key words
Hastelloy alloy/electrochemical polishing/polishing agent/roughness分类
矿业与冶金引用本文复制引用
胡宗林,陆玲,庄维伟..哈氏合金C-276电抛光中抛光液的失效分析[J].表面技术,2017,46(5):255-260,6.基金项目
江苏省科技成果转化专项资金招标项目(BA2015029) Biography:Suported by the Scientific and Technological Achievements into a Special Tender Project of Jiangsu Province (BA2015029) （BA2015029）
