西华大学学报（自然科学版）2017，Vol.36Issue(4)：78-82,5.DOI:10.3969/j.issn.1673-159X.2017.04.012
中频非平衡磁控溅射TiAlN薄膜的结构与性能
Microstructure and Properties of TiAlN Films Prepared by Mid-frequency Non-equilibrium Magnetron Sputtering
摘要
Abstract
(Ti1-xAlx)N films were prepared on YG10-cemented tungsten carbide surface by using mid-frequency non-equilibrium magnetron sputtering.The films'' properties were characterized by X-ray diffraction(XRD),scanning electron microscopy(SEM),and microhardness and surface property testing.Effects of nitrogen partial pressure,DC bias voltage,and Al content on the mechanical properties,composition,and microstructure of the films were investigated.The films were composed of (Ti,Al)N columnar crystals.The concentration of nitrogen in the film increased with the increasing of nitrogen partial pressure,while the concentrations of Al and Ti,the atom ratios rAl/(Al+Ti) and r(Al+Ti)/N were decreased.The (111) crystal orientation became less prominent,and the (220)and (200)orientations became predominant.Mechanical testing show that,with the increasing of Al concentration and DC bias voltage,the film hardness and thickness,along with the binding force between the film and substrate,all initially increase and then decrease.The maximum microhardness of the films is 2915 HV,and the maximum binding force between the film and substrate is 73 N.关键词
TiAlN薄膜/磁控溅射/力学性能Key words
TiAlN thin film/magnetron sputtering/mechanical properties分类
通用工业技术引用本文复制引用
安小建,赵广彬,程玺儒,左龙,左伟峰..中频非平衡磁控溅射TiAlN薄膜的结构与性能[J].西华大学学报（自然科学版）,2017,36(4):78-82,5.基金项目
"高档数控机床与基础制造装备"科技重大专项资助(2009ZX04012-23) （2009ZX04012-23）
四川省特种材料及制备技术重点实验室经费资助(SZJJ2009-016) （SZJJ2009-016）
西华大学研究生创新基金项目资助(Ycjj2014045). （Ycjj2014045）
