金刚石与磨料磨具工程2017，Vol.37Issue(2)：26-30,5.DOI:10.13394/j.cnki.jgszz.2017.2.0006
聚氨酯抛光垫机械抛光钆镓石榴石晶片
Mechanically polish gadolinium gallium garnet crystal with polyurethane polishing pad
摘要
Abstract
GGG (gadolinium gallium garnet) wafer is an excellent kind of laser material.However,its surface is easily scratched and the efficiency low during the polishing process.In order to avoid the scarification and improve polishing effect,polyurethane polishing pad was used to mechanically polish the GGG wafer.The influences of working pressure and plate speed on the flatness and surface quality were researched.Results show that the polyurethane polishing pad could avoid the appearance of scarification efficiently and that smaller abrasive is better for the flatness.Under the optimized parameters (70 r/min and 127 g/cm2),the flatness could reach 226 nm,with surface roughness RMS 36.3 nm and the defects of the surface could be easily eliminated by chemical mechanical polishing.关键词
钆镓石榴石(GGG)晶体/平面度/划痕/抛光垫Key words
gadolinium gallium garnet crystal/flatness/scarification/polishing pad分类
矿业与冶金引用本文复制引用
张浩然,金洙吉,王紫光,韩晓龙..聚氨酯抛光垫机械抛光钆镓石榴石晶片[J].金刚石与磨料磨具工程,2017,37(2):26-30,5.基金项目
国家重点研发计划课题(2016YFB1102205) （2016YFB1102205）
