金刚石与磨料磨具工程2017，Vol.37Issue(2)：50-54,5.DOI:10.13394/j.cnki.jgszz.2017.2.0011
圆柱形单模MPCVD装置的数值模拟与实验研究
Simulation and experimental study on a cylindrical single-mode microwave plasma CVD device
摘要
Abstract
Microwave plasma chemical vapor deposition (MPCVD) is considered to be an important method for the high quality diamond films deposition due to its unique advantages.The electric field distribution and strength in the cylindrical single-mode cavity are numerical simulated,meanwhile the study on the plasma discharge and the diamond films deposition are carried out on the MPCVD device.The results show that the simulated maximum electric field strength of the cylindrical single mode MPCVD device is 3.0 × 105 V/m when the input power is only 100 W,which shows that the cavity possesses excellent focusing capability,and the design of quartz window can avoids plasma etching at the same time.In addition,High quality micro and nano diamond films are obtained on the diameter of 50 mm silicon wafer.The results provide theoretical guidance for the development of MPCVD devices.关键词
MPCVD装置/单模/数值模拟/金刚石膜Key words
microwave plasma chemical vapor deposition device/single-mode/numerical simulation/diamond film分类
化学化工引用本文复制引用
刘繁,翁俊,汪建华,孙祁..圆柱形单模MPCVD装置的数值模拟与实验研究[J].金刚石与磨料磨具工程,2017,37(2):50-54,5.基金项目
国家自然科学基金项目(11175137) （11175137）
湖北省教育厅项目(Q20151517). （Q20151517）
