液晶与显示2017，Vol.32Issue(7)：518-525,8.DOI:10.3788/YJYXS20173207.0518
RIE模式干法刻蚀ADS产品铝腐蚀改善研究
Improvement of aluminum corrosion of ADS products by RIE etching mode dry etching
摘要
Abstract
Full-in-cell (FIC) product signal line SD-layer is Mo-Al-Mo structure, when using Reactive Ion Etching (RIE) mode dry etching device for N + etching, the chlorine compounds absorbed on the side wall surface of the Al and photoresist line, when the glass substrate is etched away from the chamber exposed to air, the moisture encountered hydrolysis reaction, which will cause corrosion of Al wire and seriously affect the product characteristics.In this paper, the Al etching phenomenon is improved by changing the etching conditions in the RIE etching mode cavity.Related experimental design and data analysis of the parameters of the pretreatment step, the post-treatment step and the de-static step including the pressure, power and time and the gas ratio is discussed.The experimental results show that the Al corrosion can be improved when the post-treatment step is 2 000 W, the ratio of O2 / SF6 is 2 000 mL·min-1/ 50 mL·min-1, the pressure is 200 mt and the time is 15 s.This condition is more advantageous in terms of TFT characteristics, Dark Ion is 1.91 μA, Photo Ioff is 4.1 pA.关键词
铝腐蚀/TFT沟道/TFT特性/沟道厚度Key words
aluminum corrosion/TFT channel/TFT characteristics/channel thickness分类
信息技术与安全科学引用本文复制引用
蒋会刚,高建剑,王晏酩,赵海生,王辉,吴超..RIE模式干法刻蚀ADS产品铝腐蚀改善研究[J].液晶与显示,2017,32(7):518-525,8.基金项目
京东方研发基金 （）
Supported by BOE Development Fund （）
