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四甲基硅流量对SiC空心微球成分及性能的影响

唐翠兰 王涛 黄景林 何小珊 刘磊 王红斌 何智兵

硅酸盐学报2017,Vol.45Issue(10):1446-1453,8.
硅酸盐学报2017,Vol.45Issue(10):1446-1453,8.DOI:10.14062/j.issn.0454-5648.2017.10.09

四甲基硅流量对SiC空心微球成分及性能的影响

Effect of Tetramethyl Silane Flowrate on Composition and Properties of SiC Hollow Microspheres

唐翠兰 1王涛 2黄景林 1何小珊 1刘磊 1王红斌 1何智兵2

作者信息

  • 1. 中国工程物理研究院激光聚变研究中心,四川绵阳 621900
  • 2. 西南科技大学材料科学与工程学院,四川绵阳 621010
  • 折叠

摘要

Abstract

Silicon carbide (SiC) hollow microspheres were fabricated at different tetramethyl silane (TMS) flowratesvia chemical vapor deposition (CVD)-pyrolysis with Si(CH3)4+C4H8+H2 as a precursor gases. The chemical composition, surface morphology, surface roughness, spherical degree and wall thickness uniformity of SiC hollow microspheres were characterized. Effect of TMS flowrate on the composition and properties of the SiC hollow microspheres was investigated. The results show that C/Si atomic ratio reduces with the increase of TMS flowrate. The surface root mean square roughness (Rq) of SiC hollow microspheres firstly decreases and then increases with the increase of TMS flowrate.Rq decreases to 78nm at the TMS flowrate of 0.25mL/min. The spherical degree of SiC hollow microspheres does not change significantly with the increase of TMS flowrate. The spherical degree of all the samples is greater than 99%. The wall thickness uniformity of SiC hollow microspheres firstly increases and then decreases with the increase of TMS flow rate, and it increases to 98% at the TMS flowrate of 0.25mL/min.

关键词

碳化硅/空心微球/四甲基硅/表面粗糙度/球形度

Key words

silicon carbide/hollow microsphere/tetramethyl silane/surface roughness/spherical degree

分类

数理科学

引用本文复制引用

唐翠兰,王涛,黄景林,何小珊,刘磊,王红斌,何智兵..四甲基硅流量对SiC空心微球成分及性能的影响[J].硅酸盐学报,2017,45(10):1446-1453,8.

基金项目

中国工程物理研究院超精密加工重点实验室基金项目(ZD16002). (ZD16002)

硅酸盐学报

OA北大核心CSCDCSTPCD

0454-5648

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