西华大学学报（自然科学版）2017，Vol.36Issue(5)：97-101,5.DOI:10.3969/j.issn.1673-159X.2017.05.015
不同Al含量的Ti/Al合金靶 对磁控溅射离子镀TiAlN薄膜力学性能的影响
Influence of Different Content of Aluminum in Ti/Al Alloy Targets on Mechanical Properties of TiAlN Films Prepared by Magnetron Sputtering Ion Plating
摘要
Abstract
TiAlN films were deposited on cemented carbide cutting tools with different aluminum content of Ti/Al alloy material. We studied different aluminum content of the target material influence on membrane performance such as the surface roughness, TiAlN film hardness and adhesion strength. Test and analysis of film hardness, adhesion, organization structure and other main performance were conducted respectively by microhardness tester, scratch tester, metallographic microscope, SEM and EDS equipment. Experimen-tal results show that with the increase of Al content in the Ti/Al alloy target, TiAlN film hardness increases firstly and then decreases, and the film adhesion increases gradually. When Al content in the Ti/Al alloy material for the value is 2/3, TiAlN film is of the best comprehensive mechanical properties such as hardness, wear resistance.关键词
Ti/Al合金靶/TiAlN薄膜/磁控溅射离子镀/力学性能Key words
Ti/Al alloy targets/TiAlN film/magnetron sputtering/mechanical properties分类
矿业与冶金引用本文复制引用
程玺儒,赵广彬..不同Al含量的Ti/Al合金靶 对磁控溅射离子镀TiAlN薄膜力学性能的影响[J].西华大学学报（自然科学版）,2017,36(5):97-101,5.基金项目
国家科技重大专项(2009ZX04012-023). （2009ZX04012-023）
