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电磁场辅助HFCVD制备高场发射性能薄膜

李嘉馨 蒋云露 胡乃修 王一佳 魏秋平 余志明 马莉 周科朝

表面技术2017,Vol.46Issue(8):145-152,8.
表面技术2017,Vol.46Issue(8):145-152,8.DOI:10.16490/j.cnki.issn.1001-3660.2017.08.024

电磁场辅助HFCVD制备高场发射性能薄膜

Carbon Films of High Field Emission Properties Farbricated by Electromagnetic Field Assisted by HFCVD

李嘉馨 1蒋云露 1胡乃修 1王一佳 1魏秋平 1余志明 2马莉 1周科朝2

作者信息

  • 1. 中南大学材料科学与工程学院,长沙410083
  • 2. 中南大学粉末冶金研究所,长沙410083
  • 折叠

摘要

Abstract

The work aims to improve field emission properties of carbon films.By taking advantage of hot filament chemical vapor deposition (HFCVD) technology,carbon films with different microstructures were prepared by applying external fields (electric field,magnetic field and electromagnetic coupling field)in respect of different methane concentrations 1% and 5% (volume fraction,full text of the same).Surface morphology of the films was observed using SEM,composition of the films was detected using Raman,andfield emission properties were characterized using field emission testing device.As a means of innovating traditional crafts,external field could influence the deposition process of CVD.The magnetic field could reduce grain size while electric field could effectively promotetranformation from sp3 phase to sp2 phase.On this basis,electromagnetic coupling field could effectively control surface morphology of high aspect ratio.Diamond film was prepared and turn-on field was 11.2 V/μm provided with methane concentration of 1%.After electric field or electromagnetic coupling field was applied,the film surface was etched,the diamond film was transformed into graphite film,turn-on field was reduced to 6.75 V/μm and the field emission properties were improved.Provided with methane concentration of 5%,turn-on field of the film prepared by magnetic field or electric field was reduced from 12.75 V/μm to 11.5 V/μm and 9 V/μm,respectively,sharp-pointed morphology,high content of graphite phase,lowest turn-on field (5.65 V/μm) the best field emission properties could be obtained provided with etching effects of electromagnetic coupling field.Various films can be prepared in the mode of external field (electric field,magnetic field and electromagnetic coupling field)-assisted HFCVD.The electromagnetic coupling field at high concentration of methanecan not only improve content of graphite phase,but also obtain the surface morphology of high aspect ratio,and therefore effectively improve the field emission properties of films.

关键词

化学气相沉积/电磁耦舍场/金刚石/石墨/纳米尖锥/场致电子发射

Key words

chemical vapor deposition/electromagnetic coupling field/diamond/graphite/nanocones/field electron emission

分类

矿业与冶金

引用本文复制引用

李嘉馨,蒋云露,胡乃修,王一佳,魏秋平,余志明,马莉,周科朝..电磁场辅助HFCVD制备高场发射性能薄膜[J].表面技术,2017,46(8):145-152,8.

基金项目

国家自然科学基金资助项目(51301211,21271188) Supported by the National Natural Science Foundation of China (51301211,21271188) (51301211,21271188)

表面技术

OA北大核心CSCDCSTPCD

1001-3660

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