燕山大学学报2017，Vol.41Issue(4)：365-370,6.DOI:10.3969/j.issn.1007-791X.2017.04.013
不同氟源对FTO薄膜结构和性能的影响
Effect of different fluorine sources on structure and properties of FTO thin films
摘要
Abstract
Tin oxide thin films doped with fluorine were deposited by spray pyrolysis.NH4F, SnF2, CF3COOH and HF were used as fluorine sources, respectively.The evolution of the microstructure and surface morphology of the films were characterized by X-ray diffraction ( XRD) and scanning electron microscopy ( SEM) .The photoelectric properties of the films were analyzed by the four-point probe, Hall measurements and UV-Vis spectroscopy. The results show that the FTO thin films exhibit a tetragonal cassiterite structure with ( 200) orientation.The morphology of films has a great change by doping with F.The undoped SnO2 thin film is mainly comprised of polygonal particles and prismatic particles, while the FTO thin film is completely composed by pyramidal particles. Among the four fluorine sources, the SnO2 thin film doped with SnF2 obtains better photoelectric properties than others, the values of resistivity, carrier concentration and optical band gap are 5.06×10-4 Ω cm, 4.850×1020 cm-3 and 4.03, respectively.the effect of fluorine sources on transmittance of the FTO films is trivial with the average transmittance of above 83%. The performance of the FTO films are mainly determined by the doping amount of fluorine.关键词
二氧化锡薄膜/掺杂/氟/喷雾热解/光电性能Key words
tin oxide thin films/doping/fluorine/spray pyrolysis/photoelectric properties分类
能源科技引用本文复制引用
王立坤,郁建元,杨静凯,王丽,牛孝友,赵洪力..不同氟源对FTO薄膜结构和性能的影响[J].燕山大学学报,2017,41(4):365-370,6.基金项目
国家重点研发计划资助项目( 2016YFB0303902) （ 2016YFB0303902）
河北省应用基础研究计划重点基础研究资助项目( 17961109D) （ 17961109D）
国家自然科学基金资助项目(51602278) （51602278）
河北省自然科学基金资助项目(E2016203149) （E2016203149）
