半导体学报（英文版）2017，Vol.38Issue(10)：107-110,4.DOI:10.1088/1674-4926/38/10/106001
An effective approach to improve split-gate flash product data retention
An effective approach to improve split-gate flash product data retention
Dailong Wei 1Zigui Cao 1Zhilin Tang1
作者信息
- 1. Department of Process Integration, Shanghai Huahong Grace Semiconductor Manufacturing Corporation, Shanghai 201203,China
- 折叠
摘要
关键词
split-gate flash/data retention/RTO annealKey words
split-gate flash/data retention/RTO anneal引用本文复制引用
Dailong Wei,Zigui Cao,Zhilin Tang..An effective approach to improve split-gate flash product data retention[J].半导体学报（英文版）,2017,38(10):107-110,4.
