强激光与粒子束2017，Vol.29Issue(11)：4-10,7.DOI:10.11884/HPLPB201729.170129
熔石英元件HF刻蚀的实验研究
Experimental study on HF etching of fused silica
摘要
Abstract
In order to understand the chemical etching process of fused silica,the reaction mechanism,processing parame-ters and the influence of HF etching on the etched surface quality are investigated.The effects of HF concentration,temperature and NH4F concentration on etching rate are obtained by performing the single factor experiment.The surface roughness,mor-phology,impurity content and damage threshold of the post-etched components are measured,and the experimental results indi-cate that the etching rate is influenced by a variety of factors,in which the effect of HF concentration is the greatest.The mor-phology of the HF-etched fused silica surface is complex,containing scratches,pits,impurities and other defects.And the main forms of defects are transverse and longitudinal scratches.The content of the main impurity defect decreases with the increase of etching time.The laser damage test shows that the damage threshold of fused silica is increased by 59.6% through the HF etch-ing process.关键词
光学制造/熔石英/化学刻蚀/亚表层缺陷/激光诱导损伤Key words
optical manufacturing/fused silica/chemical etching/sub-surface damage/laser-induced damage分类
信息技术与安全科学引用本文复制引用
程健,王景贺,张培月,张磊..熔石英元件HF刻蚀的实验研究[J].强激光与粒子束,2017,29(11):4-10,7.基金项目
科学挑战专题资助项目(JCKY2016212A506-0503) （JCKY2016212A506-0503）
国家自然科学基金项目(51475106) （51475106）
中国工程物理研究院超精密加工技术重点实验室开放基金项目(KF14007) （KF14007）
