首页|期刊导航|半导体学报(英文版)|Influence of band gap of p-type hydrogenated nanocrystalline silicon layer on the short-circuit current density in thin-film silicon solar cells

Influence of band gap of p-type hydrogenated nanocrystalline silicon layer on the short-circuit current density in thin-film silicon solar cellsOACSCDCSTPCD

Influence of band gap of p-type hydrogenated nanocrystalline silicon layer on the short-circuit current density in thin-film silicon solar cells

Shuwei Zhang;Xiangbo Zeng

State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaCollege of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100083,China

nanocrystalline siliconband gapp-layershort-circuit current densitysolar cells

nanocrystalline siliconband gapp-layershort-circuit current densitysolar cells

《半导体学报(英文版)》 2017 (11)

76-80,5

Project partly supported by the National High Technology Research and Development Program of China (No.2011AA050504).

10.1088/1674-4926/38/11/114007

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