首页|期刊导航|纳微快报（英文）|FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials

FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials

Adam Pander Akimitsu Hatta Hiroshi Furuta

纳微快报（英文）2017，Vol.9Issue(4)：107-114,8.

纳微快报（英文）2017，Vol.9Issue(4)：107-114,8.DOI:10.1007/s40820-017-0145-5

FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials

Adam Pander ¹Akimitsu Hatta ²Hiroshi Furuta¹

作者信息

1. Department of Electronic and Photonic Systems Engineering, Kochi University of Technology, Tosayamada, Kami, Kochi 782-8502, Japan
2. Center for Nanotechnology, Research Institute, Kochi University of Technology, Tosayamada, Kami, Kochi 782-8502, Japan
折叠

摘要

关键词

Carbon nanotubes/Metamaterial/FIB patterning/Secondary etching method/Chemical vapor deposition

Key words

Carbon nanotubes/Metamaterial/FIB patterning/Secondary etching method/Chemical vapor deposition

引用本文复制引用

Adam Pander,Akimitsu Hatta,Hiroshi Furuta..FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials[J].纳微快报（英文）,2017,9(4):107-114,8.

基金项目

This work was supported by JSPS KAKENHI Grant (No. 24560050). The authors would like to thank Prof. Hideo Kohno for the TEM analysis, Mr. Hiroki Miyaji for experimental support, and Ms. Justyna Pander and Mr. Mark Hebden for English guidance and support. （No. 24560050）

纳微快报（英文）

OAEISCI

ISSN：2311-6706

访问量0

下载量0

段落导航