光学精密工程2017，Vol.25Issue(11)：2803-2809,7.DOI:10.3788/OPE.20172511.2803
大高宽比硬X射线波带片制作及聚焦测试
Fabrication and focusing test of hard X-ray zone plates with high aspect ratio
摘要
Abstract
The high-resolution hard X-ray (>2 keV) Fresnel zone plates with high density and high aspect ratio was fabricated for Synchrotron Radiation Light Source .The electron beam lithography and the fabrication of hard X-ray zone plates were simulated with Monte Carlo method by combining high accelerating voltage (100 kV) with Si3N4 self-standing film to reduce the backscattering .The simulation result show s that Si3 N4 self-standing film substrate effectively reduces backscattering w hen electrons propagate in the resist ,so that the structure collapse and adhesion caused by high density and high aspect ratio are overcome .By adjusting the electron beam exposure dose ,hard X-ray Fresnel zone plates with the outermost ring width of 150 nm ,gold absorber thickness of 1 .6 μm and the aspect ratio more than 10 were fabricated on a 500 nm Si3 N4 self-standing film .Meanwhile ,a random support structure was introduced to realize the self support of the zone plates and to improve their stability .The focusing properties of the zone plates fabricated were tested with energy of 8 keV at 4W1A beamline of Beijing Synchrotron Radiation Facility ,and a clear focusing result was obtained .关键词
硬X射线波带片/电子束光刻/大高宽比波带片/电子束光刻/镂空薄膜Key words
hard X-ray zone plates/electron beam lithography/high aspect-ratio zone plate/electron beam lithography/self-standing film分类
信息技术与安全科学引用本文复制引用
李海亮,史丽娜,牛洁斌,王冠亚,谢常青..大高宽比硬X射线波带片制作及聚焦测试[J].光学精密工程,2017,25(11):2803-2809,7.基金项目
应用光学国家重点实验室开放基金资助项目(No.Y6YS053001) （No.Y6YS053001）
国家自然科学基金资助项目(No.61275170) （No.61275170）
