光学精密工程2017，Vol.25Issue(11)：2835-2844,10.DOI:10.3788/OPE.20172511.2835
极紫外光刻机多层膜反射镜表面碳污染的清洗
Cleaning of carbon contamination on multilayer optics of EUVL
摘要
Abstract
T his paper focuses on the reflectivity decrease of reflective elements caused by the carbon contamination deposited on multilayers during EUV ( Extreme Ultraviolet ) lithography working and emphasizes the clear method of carbon contamination deposited on multilayers .T he process of carbon contamination deposited on multilayers was elucidated and the damage of carbon contamination on the multilayers was introduced briefly . Several kinds of cleaning methods for carbon contamination deposited on multilayers were described in detail from cleaning mechanism ,removing rate and cleaning effect ,and their advantages and disadvantages were analyzed .The result indicates that the cleaning rates of plasma oxygen and activated oxygen reach 2 nm/min ,but the multilayer surface is easy to be oxidized in cleaning process ;and the plasma hydrogen and atomic hydrogen have relatively slow cleaning rates ,they are only about 0 .37 nm/min ,but the multilayer surface is hardly to be oxidized . Moreover ,the difficulties of different cleaning methods for X-ray multilayer mirrors in-situ are discussed .关键词
极紫外光刻机/碳污染/清洗技术/多层膜反射镜Key words
extreme ultraviolet lithography/carbon contamination/cleaning technologies/multilayers分类
信息技术与安全科学引用本文复制引用
宋源,卢启鹏,龚学鹏,王依,彭忠琦..极紫外光刻机多层膜反射镜表面碳污染的清洗[J].光学精密工程,2017,25(11):2835-2844,10.基金项目
国家科技重大专项资助项目(No.2012ZX02702001) （No.2012ZX02702001）
国家自然科学基金资助项目(No.61404139) （No.61404139）
应用光学国家重点实验室自主基金资助项目(No.Y5743FQ158) （No.Y5743FQ158）
吉林省重点科技成果转化项目(No.20150307039GX) （No.20150307039GX）
