液晶与显示2017，Vol.32Issue(10)：783-786,4.DOI:10.3788/YJYXS20173210.0783
TFT-LCD曝光工艺参数TP实验研究
Experimental research on exposure process parameter of total pitch in TFT-LCD process
董小龙 1张兴强 1江俊波 1王军才1
作者信息
- 1. 成都京东方光电科技有限公司 ,四川成都611731
- 折叠
摘要
Abstract
Based on the theories and monitoring principle of Total Pitch (TP) ,we discussed the X di-rection and Y direction variation of T P ,w hich changed by pitch value and TP measurement mark .By contrasting the same lay out but different product with the same product but different lay out ,we found that TP does not change with the variation of pitch value .However ,distortion affects the varia-tion of TP ,w hich can also be called a simplified monitoring points of distortion in the actual process . The acquisition of the interval of TP from NG to OK provides a new idea of optimizing mask design and reducing the distortion of graphics on the glass .关键词
整体倾斜度/扭曲程度/曝光/产品布局Key words
total pitch/distortion/exposure/lay out分类
信息技术与安全科学引用本文复制引用
董小龙,张兴强,江俊波,王军才..TFT-LCD曝光工艺参数TP实验研究[J].液晶与显示,2017,32(10):783-786,4.
