液晶与显示2017，Vol.32Issue(11)：877-885,9.DOI:10.3788/YJYXS20173211.0877
Mo/Al/Mo结构电极的坡度角和关键尺寸差研究
Profile and critical dimension bias of Mo/Al/Mo electrode
刘丹 1樊根瑞 1吕俊君 1秦刚 1蔡卫超 1王百强 1周禹 1饶毅 1李晨雨 1刘涛 1段海洋1
作者信息
- 1. 重庆京东方光电科技有限公司 光刻工程部,重庆 400700
- 折叠
摘要
Abstract
At present,Mo/Al/Mo structural film is electrode material in TFT-LCD industry due to its advantages .The Critical Dimension Bias which is short for CD Bias and the Profile of Mo /Al/Mo elec-trode after etch process are important parameters which determine the TFT pattern and TFT charac -teristic .Therefore,it is necessary to identify the process parameters affecting profile and CD Bias in mass production ,aiming at making profile and CD Bias under control ,which would improve produc-tion yield and quality .In this paper ,the effects of film structure ,photo condition and etch condition on profile and CD Bias are comprehensively studied .What's more ,orthogonal design for wet etch condition is conducted ,which makes it possible to understand the order of importance for wet etch process parameters .The experimental results show that aluminum film thickness decreases by about 60 nm ,profile will decrease by about 9°and CD Bias will increase by 0 .1 μm at the same time .When it comes to photo condition ,hard bake after developing process would enhance the adhesion between photo resist(PR) and metal .They will make CD bias decrease by about 0 .1um and profile correspond-ingly increase by about 9° .The over etch degree increases by 10% ,profile will decrease by about 3 .3° and CD Bias will correspondingly increase by about 0 .14 μm .The results of the orthogonal test show that the order of importance affecting CD Bias ,profile and uniformity is as follows :Chemical Knife flow > Air plasma(AP) voltage > DI water Knife flow .Through the above research ,it is found that profile and Bias are negatively correlated :The profile will decrease and CD Bias will increase when over etch degree increases .It is possible to make profile and CD Bias under control by adjusting the process parameters .关键词
Mo/Al/Mo电极/坡度角/关键尺寸差/正交试验Key words
Mo/Al/Mo structure electrode/profile/critical dimension bias/orthogonal design分类
信息技术与安全科学引用本文复制引用
刘丹,樊根瑞,吕俊君,秦刚,蔡卫超,王百强,周禹,饶毅,李晨雨,刘涛,段海洋..Mo/Al/Mo结构电极的坡度角和关键尺寸差研究[J].液晶与显示,2017,32(11):877-885,9.
