电化学2017，Vol.23Issue(6)：638-644,7.DOI:10.13208/j.electrochem.161217
添加剂丙烯基硫脲对镍电沉积的影响研究
Effect of Allylthiourea on Nickel Electrodeposition from Solution Containing Ammonia and Chloride
摘要
Abstract
The effects of allylthiourea (ATU) concentration on the cathodic polarization behaviour,nucleation and surface morphology of nickel electrodeposited on the glassy carbon electrode from ammonia-ammonium chloride-water (NH3-NH4Cl-H2O) solutions were investigated by cyclic voltammogry,cathodic polarization and current transient methods.The results revealed that the addition of ATU inhibited nickel deposition,which was enhanced with an increase in ATU concentration from 5 to 50 mg· L-1.The initial deposition kinetics corresponded to a model including instantaneous nucleation and diffusion controlled growth.In the presence of ATU,the initial nucleation of nickel electrocrystallisation remained unchanged.However,the number density of nuclei increased and the crystal growth rate decreased.Furthermore,the addition of ATU apparently made the grains finer,leading to the formation of a more compact and uniform nickel deposit as compared with that without ATU.关键词
镍电沉积/NH3-NH4Cl-H2O体系/丙烯基硫脲/添加剂Key words
nickel electrodeposition/NH3-NH4Cl-H2O solution/allyl thiourea/additive分类
化学化工引用本文复制引用
何亚宁,袁亮,丁治英,刘士军..添加剂丙烯基硫脲对镍电沉积的影响研究[J].电化学,2017,23(6):638-644,7.基金项目
“973”国家重点基础研究发展计划项目(No.2014CB643401)资助 （No.2014CB643401）
