航空材料学报2018，Vol.38Issue(1)：17-25,9.DOI:10.11868/j.issn.1005-5053.2017.000126
薄膜应力测量方法及影响因素研究进展
Research Progress on Measurement Methods and Influence Factors of Thin-film Stress
马一博 1陈牧 2颜悦 1刘伟明 2韦友秀 1张晓锋 2李佳明1
作者信息
- 1. 中国航发北京航空材料研究院透明件研究所,北京100095
- 2. 北京市先进运载系统结构透明件工程技术研究中心,北京100095
- 折叠
摘要
Abstract
With the size of thin-film electronic devices decreasing,the film stress became an important reason for the failure of thin film devices. Film stress not only affected the membrane structure,but also associated with film optics,electricity,mechanics and other properties,therefore film stress turned into one hot spot in the research field of thin-film materials. This paper reviewed the latest re-search progress of film stress,substrate curvature method,X-ray diffraction technique and Raman spectroscopy,several frequently used stress measuring techniques were compared and analyzed,and composition ratios of thin film,substrate types,magnetron sputtering process parameters (sputtering power,work pressure,substrate temperature)and annealing etc. factors influencing thin film stress were summarized. It was found that substrate curvature method was suitable for measuring almost all kinds of thin film materials. X-ray diffraction and Raman spectroscopy were just fit for measuring materials with characteristic peaks. Nanoindentation method required ex-tra stress-free samples as comparison experiments. During film fabrication and annealing process,film stress usually transited from compressive to tensile status,and several factors combined together could affect stress,so film stress could be reached the minimum value or even stress-free status through setting appropriate parameters. Finally,combined with film stress research status,accurate stress measurement methods for different materials as a thin-film stress research direction were introduced,and challenges in thin film detection range were pointed out.关键词
薄膜应力/应力测量/应力控制/基底曲率法Key words
film stress/stress measurement/stress control/substrate curvature method分类
数理科学引用本文复制引用
马一博,陈牧,颜悦,刘伟明,韦友秀,张晓锋,李佳明..薄膜应力测量方法及影响因素研究进展[J].航空材料学报,2018,38(1):17-25,9.
