人工晶体学报2018，Vol.47Issue(1)：97-101,107,6.
双光束全息干涉法制备二维光子晶体的理论分析
Theoretical Analysis for Fabrication of Two-dimensional Photonic Crystals by Dual-beam Holographic Lithography Method
摘要
Abstract
The interference patterns were simulated by calculating the intensity spatial distribution,which interfered by multi-step dual-beam holographic lithography method.The influences of rotation precision of template plane,the polarization states of incidence beams and the light intensity threshold were studied in theory.The result of investigation indicated that the relationship between the polarization states of beams and the clarity of the interference patterns provided the optimal solution on holographic lithography method.This improves the fabrication of sub-micrometer periodic structure much more efficiently in both theoretical and experimental.(OCIS 090.2880 160.5298 260.3160).关键词
光子晶体/双光束全息干涉/多次曝光/干涉图案/光强阈值Key words
photonic crystal/dual-beam holographic lithography/multi-step/interference pattern/intensity threshold分类
信息技术与安全科学引用本文复制引用
陈占林,熊玉卿..双光束全息干涉法制备二维光子晶体的理论分析[J].人工晶体学报,2018,47(1):97-101,107,6.基金项目
北方民族大学重点项目(2015KJ21) （2015KJ21）
